• Home
  • 2016 Fall Meeting at Zeiss

2016 Fall Meeting at Zeiss

  • 29 Sep 2016
  • 5:00 PM
  • Carl Zeiss SMT, Inc. One Corporation Way, Peabody, MA 01960

Registration


Registration is closed



Join NESM for our annual Fall Meeting on Thursday, September 29th at Zeiss! The meeting will consist of facility tours, two technical talks and a buffet dinner. We look forward to seeing you there! 


Meeting Schedule


5:00pm - 6:00 Tours and registration


6:00pm - 6:50pm Dinner


6:50pm - 7:00pm Introductory remarks


7:00pm - 7:35pm "Understanding the Effects and Limitations of High-Resolution Ion Beam Patterning on Hexagonal Boron Nitride via Scanning Probe Microscopy and Raman Spectroscopy" 

Josue Lopez, MIT


7:35pm - 8:10pm "Macro to Nanoscale Imaging with Planar Lenses" 

Mohammedreza KhorasaninejadHarvard University


8:10pm - 8:20pm Closing


Speaker Abstracts & Bios


"Understanding the Effects and Limitations of High-Resolution Ion Beam Patterning on Hexagonal Boron Nitride via Scanning Probe Microscopy and Raman Spectroscopy" 

Josue Lopez, MIT


Abstract: 

Plasmon polaritons in graphene and phonon polaritons in hexagonal boron nitride (hBN) have become an exciting platform to study new regimes of light-matter interactions. Specifically, their high field confinement and low phase velocity go beyond what is attainable in most plasmonic materials and conventional optics. Nonetheless, to fully exploit these polariton modes and novel light-matter interactions, nanoscale patterning of these and other two-dimensional (2D) materials is essential. To date ion beam patterning of monolayer graphene has been demonstrated, however, a technique for high-resolution and large-area patterning of multilayer van der Waals crystals such as hBN is still missing. Such nanoscale patterning is especially challenging when the material is insulating. Here we demonstrate patterning of a 35 nm-pitch hBN grating using a neon ion beam with features sizes on the order of 10 nm. We optimize patterning parameters for both helium and neon ion beams, demonstrating that an order of magnitude lower dosage is required for patterning with neon. By conducting scanning probe microscopy and Raman spectroscopy we show the effects of the ion beam bombardment on the hBN lattice. This work elucidates the potential of direct-write ion beam patterning of hBN and other emerging materials such as topological insulators for fabricating high-resolution nanophotonic structures, metamaterials, and 2D heterostructures with low loss and high optical confinement in the mid-infrared to terahertz regime.


Bio:

Josué J. López is a third year graduate student in the Photonics and Modern Electro-Magnetics Group under the supervision of Marin Soljacic. Josué has conducted extensive research at Caltech, Northwestern University, and MIT. He has co-authored publications on graphene plasmonics, graphene/hBN heterostructures, the self-assembly of carbon nanotube thin films, and the radiation resistance of graphene. His current research investigates the intersection between three topics in nanophotonics: graphene plasmons and hBN phonon-polaritons, three-dimensional photonic crystals and metamaterials, and electron-beam interactions with nanophotonic structures for free-electron X-ray lasers. Josué is a recipient of a NSF Graduate Research Fellowship and a MIT Lemelson Presidential Fellowship and is affiliated with both the Research Laboratory of Electronics (RLE) and the Institute for Soldier Nanotechnologies.


"Macro to Nanoscale Imaging with Planar Lenses" 

Mohammedreza KhorasaninejadHarvard University




Abstract:

We will present a new platform technology that enables high performance metasurfaces, sub-wavelength structured surfaces, in the visible spectrum. This platform is based on atomic layer deposition of titanium dioxide and allows molding the incident light wavefront to desired shapes including holographic images, optical vortices, and Bessel beams. The focus of this talk will be on the design and demonstration of planar lenses (metalenses). We will discuss our recent experimental realization of high numerical aperture metalenses with unprecedented efficiencies. These metalenses can focus light into a diffraction-limited spot and provide subwavelength-imaging resolution. In addition, we show that by a judicious design of metalens building blocks, one can achieve a multispectral chiral metalens (MCML) within a single metasurface layer. The MCML can simultaneously resolve chiral and spectral information of an object without the requirement of additional optical components such as polarizers, wave-plates, or even gratings. Using this MCML, we map the chiroptical properties of a macroscopic biological specimen across the visible range. Due to its straightforward fabrication and versatile functionalities, this planar platform can find wide range of applications from imaging and spectroscopy to laser-based fabrication.


Bio:

Mohammadreza (Reza) Khorasaninejad received his M.Sc. (Hons.) and Ph.D. degrees in electrical engineering from Amirkabir University of Technology, Tehran, Iran and University of Waterloo, Waterloo, Canada in 2008 and 2012, respectively. He is currently a Research Associate at the Harvard John A. Paulson School of Engineering and Applied Sciences, Cambridge, USA. His research interests include nano-photonics and nano-optics. His current work has been focused on dielectric metasurfaces.


Location: 

Carl Zeiss SMT, Inc.
One Corporation Way,
Peabody, MA 01960




© New England Society for Microscopy
Powered by Wild Apricot Membership Software